CURRENT-VOLTAGE CHARACTERISTICS FEATURES OF HETEROSTRUCTURES nGe-p(Ge2)1-x-y(GaAs)х(ZnSe)у
Аннотация
In this report results of experimental studies of continuous solid solution nGe-p(Ge2)1-x-y(GaAs)х(ZnSe)у grown by liquid phase epitaxy using the technology described in [1] was given. As substrates were used monocrystallne Ge washer with diameter 20 mm, thickness - 350 microns and n-type conductivity. Growth of the epitaxial layer was carried out a limited amount of
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